What is SIRD
SIRD is Scanning Infra-Red Depolarization. SIRD measures stress in optically transparent materials utilizing a non-contact and non-destructive technology for:
--Si wafers up to 300mm
--Compound materials
--Solar cells
Why SIRD needed
Reason is Stress will be caused by any abrasive manufacturing or temperature-related process step during the manufacture of wafers as well as in IC fabs. Small defects cause a much larger Stress area. Even defects near the edge propagate deep into the wafer Analytical operations reveal the actual defect together with its true location.
How SIRD execute stress measurement
![](/uploads/allimg/200226/1-20022610502W48.png)
Bare wafer measurement sample
Global defects
![](/uploads/allimg/200226/1-20022610531a29.png)
Big ring like patterns probably caused by non-uniformities of dopant or impurity concentration
Local defects distribution:
Differential Depolarization / High-pass filtered
Defects distribute in different place on wafer